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Books in Proceedings series

  • Little Women

    Louisa May Alcott, Sandra Burr

    Audio Cassette (Unabridged Library Edition, Nov. 1, 1998)
    Meg, Jo, Beth and Amy manage to lead interesting lives despite Father's absence at war and the family's lack of money. Whether they're putting on a play or forming a secret society, their gaiety is infectious. Written from Louisa May Alcott's own experiences, this remarkable novel has been treasured for generations.
  • Chemical-Mechanical Polishing 2000 - Fundamentals and Materials Issues: Volume 613

    Rajiv K. Singh, Rajeev Bajaj, Mansour Moinpour, Marc Meuris

    Paperback (Cambridge University Press, June 5, 2014)
    Chemical-mechanical polishing (CMP) is a critical technology in the planarization of multilevel metallization systems and shallow-trench isolation in semiconductor manufacturing. Other emerging applications for this technology include flat-panel displays, magnetic data storage and microelectromechanical systems. The rapid emergence of copper as the conducting material for integrated circuits has further pushed CMP technology to the forefront of semiconductor manufacturing. However, a basic understanding of the CMP process, which is necessary to enable further advances, is inadequate. This book, first published in 2001, provides an insight into the fundamental processes in CMP. Presentations from academia, government institutions and industry are featured. Topics include: CMP mechanisms; dielectric and metal CMP; process integration and manufacturability; and CMP consumables.